Resources

Facilities

(Ultra)Wide Bandgap Semiconductor Research Laboratory (Bhuiyan lab) is located at UML North campus at Ball Hall 308. At campus, we have access to state-of-the-art facilities and equipment, both dedicated and shared, to perform cutting edge research on semiconductor materials and devices.

Materials Growth: 

  • Low-Pressure Chemical Vapor Deposition (LPCVD) system at Ball Hall 308 (Bhuiyan Laboratory) for the growth of (ultra)wide bandgap materials such as Ga2O3 thin films, alloys and heterostructures.
Nanofabrication:
  • UML Nanofabrication Lab: The Nanofabrication Lab at UML North campus features a state-of-the-art, 4,200 ft2 Class 100 clean room equipped with over 40 pieces of process and analytical instrumentation for complex research projects that require micro and nano scale fabrication.
  • Cambridge Nanofabrication lab at Harvard Center for Nanoscale Systems (CNS): Harvard Nanofabrication lab features a 10,500 sq ft cleanroom with state-of-the-art instruments to support extensive range of fabrication and processing techniques, enabling a vast array of device structures from novel materials.

 

Electrical Characterization:

  • Temperature dependent Hall effect measurement system (Bhuiyan Lab at Ball Hall 308)
  • Keithley 4200A-SCS Semiconductor Parameter Analyzer at Falmouth annex 207B (UML North campus).
  • Probe station for I-V and C-V characterization at Falmouth annex 207B.

Radiation Laboratory:

  • Radiation Laboratory at UML North campus offers wide range of research capabilities in developing novel detectors for neutrons and gamma rays, simulating radiation conditions of hostile space environments, non-destructive testing and analysis, investigating radiation induced modifications of materials and developing radiation resistant electronics and optoelectronics using-

o   Gamma Facilities

o   Neutron Facilities

o   Proton Facilities